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Xuanxuan Chen
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Directed Self-Assembly of Polystyrene-b-poly(propylene carbonate) on Chemical Patterns via Thermal Annealing for Next Generation Lithography
GW Yang, GP Wu, X Chen, S Xiong, CG Arges, S Ji, PF Nealey, XB Lu, ...
Nano letters 17 (2), 1233-1239, 2017
1052017
Three-tone chemical patterns for block copolymer directed self-assembly
LD Williamson, RN Seidel, X Chen, HS Suh, P Rincon Delgadillo, ...
ACS applied materials & interfaces 8 (4), 2704-2712, 2016
582016
Real-time atomic force microscopy imaging of block copolymer directed self assembly
J Raybin, J Ren, X Chen, R Gronheid, PF Nealey, SJ Sibener
Nano Letters 17 (12), 7717-7723, 2017
392017
Characterization of the shape and line-edge roughness of polymer gratings with grazing incidence small-angle X-ray scattering and atomic force microscopy
HS Suh, X Chen, PA Rincon-Delgadillo, Z Jiang, J Strzalka, J Wang, ...
Journal of Applied Crystallography 49 (3), 823-834, 2016
362016
Derivation of multiple covarying material and process parameters using physics-based modeling of X-ray data
G Khaira, M Doxastakis, A Bowen, J Ren, HS Suh, T Segal-Peretz, ...
Macromolecules 50 (19), 7783-7793, 2017
352017
Ionic Liquids as Additives to Polystyrene-Block-Poly(Methyl Methacrylate) Enabling Directed Self-Assembly of Patterns with Sub-10 nm Features
X Chen, C Zhou, SJ Chen, GSW Craig, P Rincon-Delgadillo, T Dazai, ...
ACS applied materials & interfaces 10 (19), 16747-16759, 2018
322018
Engineering the kinetics of directed self-assembly of block copolymers toward fast and defect-free assembly
J Ren, C Zhou, X Chen, M Dolejsi, GSW Craig, PA Rincon Delgadillo, ...
ACS applied materials & interfaces 10 (27), 23414-23423, 2018
312018
Determination of the porphyrin orientation distribution in Langmuir monolayers by polarized epifluorescence
A Tronin, J Strzalka, X Chen, PL Dutton, JK Blasie
Langmuir 16 (25), 9878-9886, 2000
292000
Influence of additives on the interfacial width and line edge roughness in block copolymer lithography
DF Sunday, X Chen, TR Albrecht, D Nowak, P Rincon Delgadillo, T Dazai, ...
Chemistry of Materials 32 (6), 2399-2407, 2020
202020
Molecular transfer printing of block copolymer patterns over large areas with conformal layers
T Inoue, DW Janes, J Ren, HS Suh, X Chen, CJ Ellison, PF Nealey
Advanced Materials Interfaces 2 (10), 2015
162015
Sub-10 nm Feature Sizes of Disordered Polystyrene-block-poly(methyl methacrylate) Copolymer Films Achieved by Ionic Liquid Additives with Selectively …
S Chen, G Wu, X Wang, X Chen, P Nealey
ACS Applied Polymer Materials 2 (2), 427-436, 2019
102019
Defect annihilation in the directed self-assembly of block copolymers in films with increasing thickness
X Chen, PR Delgadillo, Z Jiang, GSW Craig, R Gronheid, PF Nealey
Macromolecules 52 (20), 7798-7805, 2019
102019
Directed Self-Assembly of Hierarchical Supramolecular Block Copolymer Thin Films on Chemical Patterns
GP Wu, X Liu, X Chen, HS Suh, X Li, J Ren, CG Arges, F Li, Z Jiang, ...
Advanced Materials Interfaces 3 (13), 2016
102016
Grazing-incidence small angle x-ray scattering studies of nanoscale polymer gratings
M Doxastakis, HS Suh, X Chen, PAR Delgadillo, L Wan, L Williamson, ...
Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015
72015
Directed self-assembly of PS-b-PMMA with ionic liquid addition
X Chen, T Seo, P Rincon-Delgadillo, T Matsumiya, A Kawaue, ...
Advances in Patterning Materials and Processes XXXIII 9779, 96-101, 2016
62016
Orientation control of high-χ triblock copolymer for sub-10 nm patterning using fluorine-containing polymeric additives
J Li, C Zhou, X Chen, PA Rincon Delgadillo, PF Nealey
Journal of Micro/Nanolithography, MEMS, and MOEMS 18 (3), 035501-035501, 2019
52019
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
A Kawaue, T Seshimo, T Maehashi, T Matsumiya, K Miyagi, H Yamano, ...
US Patent 10179866B2, 2019
22019
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
A Kawaue, T Seshimo, T Maehashi, T Matsumiya, K Miyagi, H Yamano, ...
US Patent 10,179,866, 2019
22019
Directed self-assembly of triblock copolymers for sub-10 nm nanofabrication using polymeric additives
J Li, C Zhou, X Chen, P Rincon-Delgadillo, P Nealey
Advances in Patterning Materials and Processes XXXV 10586, 91-97, 2018
22018
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
A Kawaue, T Seshimo, T Maehashi, T Matsumiya, K Miyagi, H Yamano, ...
US Patent 9,828,519, 2017
12017
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