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Sanket Sant
Sanket Sant
Staff engineer, Lam research,
Verified email at lamresearch.com
Title
Cited by
Cited by
Year
Multiple spacer steps for pitch multiplication
S Sant, G Sandhu, NR Rueger
US Patent 7,560,390, 2009
2742009
Waferless auto conditioning
J Guha, S Sant, B Jinnai
US Patent 8,784,676, 2014
1702014
Deposition and patterning of diamondlike carbon as antiwear nanoimprint templates
S Ramachandran, L Tao, TH Lee, S Sant, LJ Overzet, MJ Goeckner, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006
492006
Inductively coupled dual zone processing chamber with single planar antenna
SP Sant
US Patent 7,972,471, 2011
292011
Effect of surface temperature on plasma-surface interactions in an inductively coupled modified gaseous electronics conference reactor
B Zhou, EA Joseph, SP Sant, Y Liu, A Radhakrishnan, LJ Overzet, ...
Journal of Vacuum Science & Technology A 23 (6), 1657-1667, 2005
262005
Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes
N Sant, SanketRueger
US Patent App. 11/043,629, 2006
24*2006
Multiple spacer steps for pitch multiplication
S Sant, GS Sandhu, NR Rueger
US Patent 8,003,542, 2011
222011
Method and apparatus of halogen removal
H Singh, S Sant, SI Chou, V Vahedi, R Casaes, S Ramachandran
US Patent 8,525,139, 2013
212013
Investigation and modeling of plasma-wall interactions in inductively coupled fluorocarbon plasmas
EA Joseph, B Zhou, SP Sant, LJ Overzet, MJ Goeckner
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (3 …, 2004
182004
Surface kinetics with low ion energy bombardment in fluorocarbon plasmas
CT Nelson, SP Sant, LJ Overzet, MJ Goeckner
Plasma Sources Science and Technology 16 (4), 813, 2007
152007
Edge ring assembly for plasma processing chamber and method of manufacture thereof
SP Sant, RG O'neill
US Patent App. 13/562,675, 2014
142014
Plasma etching device with plasma etch resistant coating
S Sant
US Patent App. 15/158,397, 2016
102016
Method for positioning spacers in pitch multiplication
S Sant, G Sandhu, NR Rueger
US Patent 8,865,598, 2014
102014
Method and apparatus of halogen removal using optimal ozone and UV exposure
S Sant, SI Chou
US Patent 8,232,538, 2012
102012
Relationship between gas-phase chemistries and surface processes in fluorocarbon etch plasmas: A process rate model
SP Sant, CT Nelson, LJ Overzet, MJ Goeckner
Journal of Vacuum Science & Technology A 27 (4), 631-642, 2009
102009
Method for positioning spacers in pitch multiplication
S Sant, G Sandhu, NR Rueger
US Patent 8,598,041, 2013
92013
Method for positioning spacers for pitch multiplication
S Sant, G Sandhu, NR Rueger
US Patent 8,173,550, 2012
92012
Chemistry in long residence time fluorocarbon plasmas
SP Sant, CT Nelson, LJ Overzet, MJ Goeckner
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 27 (2 …, 2009
82009
Role of chamber dimension in fluorocarbon based deposition and etching of SiO2 and its effects on gas and surface-phase chemistry
EA Joseph, BS Zhou, SP Sant, LJ Overzet, MJ Goeckner
Journal of Vacuum Science & Technology A 26 (3), 545-554, 2008
72008
Method for positioning spacers in pitch multiplication
S Sant, G Sandhu, NR Rueger
US Patent 9,117,766, 2015
62015
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