Follow
Rafal Rakowski
Rafal Rakowski
Verified email at imperial.ac.uk - Homepage
Title
Cited by
Cited by
Year
Enhanced X-ray emission in the 1-keV range from a laser-irradiated gas puff target produced using the double-nozzle setup
H Fiedorowicz, A Bartnik, R Jarocki, R Rakowski, M Szczurek
Applied Physics B 70, 305-308, 2000
1432000
A high-flux high-order harmonic source
P Rudawski, CM Heyl, F Brizuela, J Schwenke, A Persson, E Mansten, ...
Review of Scientific Instruments 84 (7), 2013
1282013
Compact laser plasma EUV source based on a gas puff target for metrology applications
H Fiedorowicz, A Bartnik, R Jarocki, J Kostecki, J Krzywiński, ...
Journal of Alloys and Compounds 401 (1-2), 99-103, 2005
932005
Spatial and spectral properties of the high-order harmonic emission in argon for seeding applications
X He, M Miranda, J Schwenke, O Guilbaud, T Ruchon, C Heyl, ...
Physical Review A 79 (6), 063829, 2009
882009
Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target
R Rakowski, A Bartnik, H Fiedorowicz, F De Gaufridy De Dortan, ...
Applied Physics B 101, 773-789, 2010
752010
Interference effects in two-color high-order harmonic generation
X He, JM Dahlström, R Rakowski, CM Heyl, A Persson, J Mauritsson, ...
Physical Review A 82 (3), 033410, 2010
602010
Strong temperature effect on X-ray photo-etching of polytetrafluoroethylene using a 10 Hz laser-plasma radiation source based on a gas puff target
A Bartnik, H Fiedorowicz, R Jarocki, L Juha, J Kostecki, R Rakowski, ...
Applied Physics B 82, 529-532, 2006
462006
Short-wavelength ablation of molecular solids: pulse duration and wavelength effects
L Juha, M Bittner, D Chvostová, J Krása, M Kozlová, M Pfeifer, J Polan, ...
Journal of Micro/Nanolithography, MEMS and MOEMS 4 (3), 033007-033007-11, 2005
462005
A compact, quasi-monochromatic laser-plasma EUV source based on a double-stream gas-puff target at 13.8 nm wavelength
PW Wachulak, A Bartnik, H Fiedorowicz, T Feigl, R Jarocki, J Kostecki, ...
Applied Physics B 100, 461-469, 2010
442010
Micromachining of organic polymers by direct photo-etching using a laser plasma X-ray source
H Fiedorowicz, A Bartnik, M Bittner, L Juha, J Krasa, P Kubat, ...
Microelectronic engineering 73, 336-339, 2004
382004
Micromachining of organic polymers by X-ray photo-etching using a 10 Hz laser-plasma radiation source
A Bartnik, H Fiedorowicz, R Jarocki, L Juha, J Kostecki, R Rakowski, ...
Microelectronic engineering 78, 452-456, 2005
352005
Pulsed X-ray radiography of a gas jet target for laser–matter interaction experiments with the use of a CCD detector
R Rakowski, A Bartnik, H Fiedorowicz, R Jarocki, J Kostecki, J Mikołajczyk, ...
Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2005
262005
Metrology of high-order harmonics for free-electron laser seeding
C Erny, E Mansten, M Gisselbrecht, J Schwenke, R Rakowski, X He, ...
New Journal of Physics 13 (7), 073035, 2011
202011
Soft x-ray emission from a double-stream gas puff target irradiated by a nanosecond laser pulse
A Bartnik, H Fiedorowicz, R Rakowski, M Szczurek, F Bijkerk, R Bruijn, ...
ECLIM 2000: 26th European Conference on Laser Interaction with Matter 4424 …, 2001
202001
EUV emission from solids illuminated with a laser-plasma EUV source
A Bartnik, H Fiedorowicz, R Jarocki, J Kostecki, R Rakowski, M Szczurek
Applied Physics B 93, 737-741, 2008
172008
Femtosecond visible transient absorption spectroscopy of chlorophyll-f-containing photosystem II
JJT Noura Zamzam, Rafal Rakowski, Marius Kaucikas, Gabriel Dorlhiac, Sefania ...
PNAS, 2020
16*2020
Laser-produced plasma EUV source based on tin-rich, thin-layer targets
R Rakowski, J Mikołajczyk, A Bartnik, H Fiedorowicz, ...
Applied Physics B 102, 559-567, 2011
152011
Micro-and nanoprocessing of polymers using a laser plasma extreme ultraviolet source
A Bartnik, H Fiedorowicz, R Jarocki, J Kostecki, R Rakowski, A Szczurek, ...
Acta Physica Polonica A 117 (2), 384-390, 2010
152010
Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target
R Rakowski, A Bartnik, H Fiedorowicz, R Jarocki, J Kostecki, J Krzywinski, ...
Optica Applicata 36 (4), 593, 2006
142006
Compact laser plasma EUV source based on a gas puff target for metrology
H Fiedorowicz, A Bartnik, R Jarocki, J Kostecki, J Mikolajczyk, R Rakowski, ...
Emerging Lithographic Technologies VII 5037, 389-396, 2003
132003
The system can't perform the operation now. Try again later.
Articles 1–20