Kun Qian
Kun Qian
Verified email at berkeley.edu
Title
Cited by
Cited by
Year
Measurement and analysis of variability in 45 nm strained-Si CMOS technology
LT Pang, K Qian, CJ Spanos, B Nikolic
IEEE Journal of Solid-State Circuits 44 (8), 2233-2243, 2009
1372009
Physically justifiable die-level modeling of spatial variation in view of systematic across wafer variability
L Cheng, P Gupta, CJ Spanos, K Qian, L He
IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2011
642011
A comprehensive model of process variability for statistical timing optimization
K Qian, CJ Spanos
Design for Manufacturability through Design-Process Integration II 6925, 69251G, 2008
272008
Technology variability from a design perspective
B Nikolic, JH Park, J Kwak, B Giraud, Z Guo, LT Pang, SO Toh, R Jevtic, ...
IEEE Transactions on Circuits and Systems I: Regular Papers 58 (9), 1996-2009, 2011
192011
Hierarchical modeling of spatial variability with a 45nm example
K Qian, B Nikolić, CJ Spanos
Design for Manufacturability through Design-Process Integration III 7275, 727505, 2009
142009
Variability modeling and statistical parameter extraction for CMOS devices
K Qian
UC Berkeley, 2015
122015
Near-threshold circuit variability in 14nm finfets for ultra-low power applications
S Balasubramanian, N Pimparkar, M Kushare, V Mahajan, J Bansal, ...
2016 17th International Symposium on Quality Electronic Design (ISQED), 258-262, 2016
62016
Variability aware compact model characterization for statistical circuit design optimization
Y Qiao, K Qian, CJ Spanos
Design for Manufacturability through Design-Process Integration VI 8327, 83270J, 2012
42012
Hierarchical modeling of spatial variability of a 45nm test chip
K Qian, CJ Spanos
Proc. SPIE 7275, 234-238, 2009
22009
45nm transistor variability study for memory characterization
K Qian, CJ Spanos
Design for Manufacturability through Design-Process Integration IV 7641, 76410G, 2010
12010
Collaborative research on emerging technologies and design
AR Neureuther, J Rubinstein, M Miller, K Yamazoe, E Chin, C Levy, ...
Photomask and Next-Generation Lithography Mask Technology XVIII 8081, 80810N, 2011
2011
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