The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering J Emmerlich, S Mráz, R Snyders, K Jiang, JM Schneider
Vacuum 82 (8), 867-870, 2008
142 2008 On the phase formation of sputtered hafnium oxide and oxynitride films K Sarakinos, D Music, S Mráz, K Jiang, F Nahif, A Braun, C Zilkens, ...
Journal of Applied Physics 108 (1), 2010
52 2010 Ionized physical vapor deposited Al2 O3 films: Does subplantation favor formation of α‐Al2 O3 ? K Sarakinos, D Music, F Nahif, K Jiang, A Braun, C Zilkens, JM Schneider
physica status solidi (RRL)–Rapid Research Letters 4 (7), 154-156, 2010
49 2010 Ab initio study of effects of substitutional additives on the phase stability of γ-alumina K Jiang, D Music, K Sarakinos, JM Schneider
Journal of physics: Condensed matter 22 (50), 505502, 2010
46 2010 Investigation of the internal back reflectance of rear-side dielectric stacks for c-Si solar cells KO Davis, K Jiang, C Demberger, H Zunft, H Haverkamp, D Habermann, ...
IEEE Journal of Photovoltaics 3 (2), 641-648, 2013
39 2013 Low temperature synthesis of α-Al2O3 films by high-power plasma-assisted chemical vapour deposition K Jiang, K Sarakinos, S Konstantinidis, JM Schneider
Journal of Physics D: Applied Physics 43 (32), 325202, 2010
31 2010 Tailoring the optical properties of APCVD titanium oxide films for all-oxide multilayer antireflection coatings KO Davis, K Jiang, D Habermann, WV Schoenfeld
IEEE Journal of Photovoltaics 5 (5), 1265-1270, 2015
30 2015 Characterization of POCl P Rothhardt, S Meier, S Maier, K Jiang, A Wolf, D Biro
IEEE Journal of Photovoltaics 4 (3), 827-833, 2014
24 2014 Influence of precursor gas ratio and firing on silicon surface passivation by APCVD aluminium oxide KO Davis, K Jiang, M Wilson, C Demberger, H Zunft, H Haverkamp, ...
physica status solidi (RRL)–Rapid Research Letters 7 (11), 942-945, 2013
22 2013 Composition–constitution–morphology relationship of Al2O3 thin films deposited by plasma assisted chemical vapor deposition R Snyders, K Jiang, D Music, S Konstantinidis, T Markus, A Reinholdt, ...
Surface and Coatings Technology 204 (1-2), 215-221, 2009
22 2009 Pulsed plasma enhanced chemical vapor deposition of alumina thin films: influence of the duty cycle on structure and elastic properties S Konstantinidis, K Jiang, A Roobroek, F Renaux, JM Schneider
Plasma Processes and Polymers 8 (7), 651-657, 2011
16 2011 Co-diffused APCVD boron rear emitter with selectively etched-back FSF for industrial n-type Si solar cells Y Schiele, F Book, C Demberger, K Jiang, G Hahn
11 2014 Improved control of the phosphorous surface concentration during in‐line diffusion of c‐Si solar cells by APCVD KO Davis, K Jiang, C Demberger, H Zunft, H Haverkamp, D Habermann, ...
physica status solidi (RRL)–Rapid Research Letters 7 (5), 319-321, 2013
9 2013 Al2O3 thin films: relation between structural evolution, mechanical properties and stability K Jiang
Aachen, Techn. Hochsch., Diss., 2011, 2011
8 2011 Thixocasting Steel Hand Tools using Al2 O3 ‐coated Steel and Molybdenum Dies M Bünck, E Subasic, A Bührig‐Polaczek, K Jiang, S Münstermann, ...
steel research international 81 (7), 581-588, 2010
8 2010 Up‐scaling of a Low Temperature PACVD Process for the Deposition of α/γ‐Nanocrystalline Alumina Coated Tools for Thixocasting of 1.2208 steel K Jiang, S Münstermann, HJ Günther, JM Schneider
steel research international 81 (7), 597-602, 2010
6 2010 Interfacial structure and passivation properties of Al2 O3 on Silicon W Zhang, F Wang, KO Davis, K Jiang, WV Schoenfeld, JP Looney
2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC), 1163-1168, 2016
5 2016 Optical modeling of the internal back reflectance of various c-Si dielectric stacks featuring AlOx , SiNx , TiO2 and SiO2 KO Davis, HP Seigneur, K Jiang, C Demberger, H Zunft, H Haverkamp, ...
2012 38th IEEE Photovoltaic Specialists Conference, 001032-001035, 2012
4 2012 Thixocasting combination spanners using stainless steel X39CrMo17 M Bünck, E Subasic, A Bührig-Polaczek, K Jiang, S Münstermann, ...
Transactions of Nonferrous Metals Society of China 20, s998-s1004, 2010
4 2010 Silicon material substrate doping method, structure and applications KO Davis, WV Schoenfeld, K Jiang, D Habermann
US Patent App. 13/910,310, 2014
3 2014 