| Freeform metrology using subaperture stitching interferometry C Supranowitz, JP Lormeau, C Maloney, P Murphy, P Dumas Optics and Measurement International Conference 2016 10151, 101510D, 2016 | 31 | 2016 |
| Improving low, mid and high-spatial frequency errors on advanced aspherical and freeform optics with MRF C Maloney, JP Lormeau, P Dumas Third European Seminar on Precision Optics Manufacturing 10009, 100090R, 2016 | 25 | 2016 |
| Manufacturing aspheric mirrors made of zero thermal expansion cordierite ceramics using Magnetorheological Finishing (MRF) J Sugawara, C Maloney Advances in Optical and Mechanical Technologies for Telescopes and …, 2016 | 11 | 2016 |
| Novel high-NA MRF toolpath supports production of concave hemispheres C Maloney, C Supranowitz, P Dumas Optifab 2017 10448, 1044806, 2017 | 9 | 2017 |
| Enhanced resolution and accuracy of freeform metrology through Subaperture Stitching Interferometry C Supranowitz, C Maloney, P Murphy, P Dumas Optifab 2017 10448, 1044818, 2017 | 9 | 2017 |
| Impact of pupil plane filtering on mask roughness transfer B Baylav, C Maloney, Z Levinson, J Bekaert, A Vaglio Pret, BW Smith Journal of Vacuum Science & Technology B, Nanotechnology and …, 2013 | 9 | 2013 |
| New high-precision deep concave optical surface manufacturing capability F Piché, C Maloney, SJ VanKerkhove, C Supranowicz, P Dumas, ... Optifab 2017 10448, 104480H, 2017 | 8 | 2017 |
| Fine figure correction and other applications using novel MRF fluid designed for ultra-low roughness C Maloney, ES Oswald, P Dumas Optifab 2015 9633, 96330G, 2015 | 8 | 2015 |
| Feasibility of compensating for EUV field edge effects through OPC C Maloney, J Word, GL Fenger, A Niroomand, GF Lorusso, R Jonckheere, ... Extreme Ultraviolet (EUV) Lithography V 9048, 90480T, 2014 | 6 | 2014 |
| Extending magnetorheological finishing to address short radius concave surfaces and mid-spatial frequency errors C Maloney, W Messner Optifab 2019 11175, 111750N, 2019 | 4 | 2019 |
| Every photon counts: improving low, mid, and high-spatial frequency errors on astronomical optics and materials with MRF C Maloney, JP Lormeau, P Dumas Advances in Optical and Mechanical Technologies for Telescopes and …, 2016 | 3 | 2016 |
| Hybridization of a sigma-delta-based CMOS hybrid detector KE Kolb, NC Stoffel, B Douglas, CW Maloney, AD Raisanen, B Ashe, ... SPIE Astronomical Telescopes+ Instrumentation, 77420C-77420C-9, 2010 | 3 | 2010 |
| Precision production: enabling deterministic throughput for precision aspheres with MRF C Maloney, N Entezarian, P Dumas Optifab 2017 10448, 104480I, 2017 | 2 | 2017 |
| Pattern fidelity verification for logic design in EUV lithography M Sugawara, E Hendrickx, V Philipsen, C Maloney, G Fenger Extreme Ultraviolet (EUV) Lithography V 9048, 90480V, 2014 | 2 | 2014 |
| Compensation of extreme ultraviolet lithography image field edge effects through optical proximity correction C Maloney | 2 | 2014 |
| New meter-class MRF platforms offer multiple size and capability options C Maloney, P Dumas Optifab 2019 11175, 111750Q, 2019 | 1 | 2019 |
| Longer wavelength EUV lithography (LW-EUVL) CW Maloney, BW Smith SPIE Advanced Lithography, 83222Z-83222Z-8, 2012 | 1 | 2012 |
| Advances in MRF enable better mid-spatial frequency correction on precision optics C Maloney LASER FOCUS WORLD 51 (12), 43-45, 2015 | | 2015 |
| Mitigating mask roughness via pupil filtering B Baylav, C Maloney, Z Levinson, J Bekaert, AV Pret, B Smith SPIE Advanced Lithography, 90521O-90521O-10, 2014 | | 2014 |
| Characterization of a Geiger-mode Avalanche Photodiode CW Maloney | | |
